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PASSIVATION STACKS

机译:钝化堆栈

摘要

A passivation stack can include a laminated film, including from 8 to 40 alternating layers of HfO2 and SiO2. The layers can individually have a thickness from 8 Angstroms to 40 Angstroms, and the laminated film can have a total thickness of 280 Angstroms to 600 Angstroms. The passivation stack can also include a barrier film of HfO2 having a thickness from 50 Angstroms to 300 Angstroms applied to the laminated film.
机译:钝化堆可包括层压膜,包括8至40个HFO2和SiO 2的交替层。 层可以单独地具有从8埃至40埃的厚度,并且层压膜可以具有280埃的总厚度至600埃。 钝化堆还可以包括厚度从50埃至300埃施加到层压膜的300埃的HFO 2的阻挡膜。

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